APA

Milanov A. P., Xu K., Laha A., Bugiel E., Ranjith R., Schwendt D., Osten H. J., Parala H., Fischer R. A. & Devi A. (20100301). Growth of crystalline Gd2O3 thin films with a high-quality interface on Si(100) by low-temperature H2O-assisted atomic layer deposition. : Journal of the American Chemical Society.

Chicago

Milanov Andrian P, Xu Ke, Laha Apurba, Bugiel Eberhard, Ranjith Ramadurai, Schwendt Dominik, Osten H Jörg, Parala Harish, Fischer Roland A and Devi Anjana. 20100301. Growth of crystalline Gd2O3 thin films with a high-quality interface on Si(100) by low-temperature H2O-assisted atomic layer deposition. : Journal of the American Chemical Society.

Harvard

Milanov A. P., Xu K., Laha A., Bugiel E., Ranjith R., Schwendt D., Osten H. J., Parala H., Fischer R. A. and Devi A. (20100301). Growth of crystalline Gd2O3 thin films with a high-quality interface on Si(100) by low-temperature H2O-assisted atomic layer deposition. : Journal of the American Chemical Society.

MLA

Milanov Andrian P, Xu Ke, Laha Apurba, Bugiel Eberhard, Ranjith Ramadurai, Schwendt Dominik, Osten H Jörg, Parala Harish, Fischer Roland A and Devi Anjana. Growth of crystalline Gd2O3 thin films with a high-quality interface on Si(100) by low-temperature H2O-assisted atomic layer deposition. : Journal of the American Chemical Society. 20100301.