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	1.	1.3-mW tunable and narrow-band continuous-wave light source at 191 nm. [electronic resource] by Scholz, Matthias Opalevs, Dmitrijs Leisching, Patrick Kaenders, Wilhelm Wang, Guiling Wang, Xiaoyang Li, Rukang Chen, Chuangtian Producer: 20130328 In: Optics express vol. 20 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	2.	Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light source. [electronic resource] by Vetter, Andreas Kirner, Raoul Opalevs, Dmitrijs Scholz, Matthias Leisching, Patrick Scharf, Toralf Noell, Wilfried Rockstuhl, Carsten Voelkel, Reinhard Producer: 20180823 In: Optics express vol. 26 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	3.	Mask-aligner lithography using a continuous-wave diode laser frequency-quadrupled to 193 nm. [electronic resource] by Kirner, Raoul Vetter, Andreas Opalevs, Dmitrijs Gilfert, Christian Scholz, Matthias Leisching, Patrick Scharf, Toralf Noell, Wilfried Rockstuhl, Carsten Voelkel, Reinhard Producer: 20180207 In: Optics express vol. 26 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)

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