APA

Hellwig M., Parala H., Cybinksa J., Barreca D., Gasparotto A., Niermann B., Becker H., Rogalla D., Feydt J., Irsen S., Mudring A., Winter J., Fischer R. A. & Devi A. (20111206). Atomic vapor deposition approach to In2O3 thin films. : Journal of nanoscience and nanotechnology.

Chicago

Hellwig Malte, Parala Harish, Cybinksa Joanna, Barreca Davide, Gasparotto Alberto, Niermann Benedikt, Becker Hans-Werner, Rogalla Detlef, Feydt Jürgen, Irsen Stephan, Mudring Anja-Verena, Winter Jörg, Fischer Roland A and Devi Anjana. 20111206. Atomic vapor deposition approach to In2O3 thin films. : Journal of nanoscience and nanotechnology.

Harvard

Hellwig M., Parala H., Cybinksa J., Barreca D., Gasparotto A., Niermann B., Becker H., Rogalla D., Feydt J., Irsen S., Mudring A., Winter J., Fischer R. A. and Devi A. (20111206). Atomic vapor deposition approach to In2O3 thin films. : Journal of nanoscience and nanotechnology.

MLA

Hellwig Malte, Parala Harish, Cybinksa Joanna, Barreca Davide, Gasparotto Alberto, Niermann Benedikt, Becker Hans-Werner, Rogalla Detlef, Feydt Jürgen, Irsen Stephan, Mudring Anja-Verena, Winter Jörg, Fischer Roland A and Devi Anjana. Atomic vapor deposition approach to In2O3 thin films. : Journal of nanoscience and nanotechnology. 20111206.