Development of Nickel-Based Negative Tone Metal Oxide Cluster Resists for Sub-10 nm Electron Beam and Helium Ion Beam Lithography. [electronic resource]

By: Contributor(s): Publication details: ACS applied materials & interfaces Apr 2020Description: 19616-19624 p. digitalISSN:
  • 1944-8252
Online resources: In: ACS applied materials & interfaces vol. 12
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Publication Type: Journal Article

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