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	1.	Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N [electronic resource] by Faraz, Tahsin van Drunen, Maarten Knoops, Harm C M Mallikarjunan, Anupama Buchanan, Iain Hausmann, Dennis M Henri, Jon Kessels, Wilhelmus M M Producer: 20180730 In: ACS applied materials & interfaces vol. 9 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	2.	In Situ Infrared Absorption Study of Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride. [electronic resource] by Peña, Luis Fabián Mattson, Eric C Nanayakkara, Charith E Oyekan, Kolade A Mallikarjunan, Anupama Chandra, Haripin Xiao, Manchao Lei, Xinjian Pearlstein, Ronald M Derecskei-Kovacs, Agnes Chabal, Yves J Producer: 20180515 In: Langmuir : the ACS journal of surfaces and colloids vol. 34 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)

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