Area-Selective ALD of Ru on Nanometer-Scale Cu Lines through Dimerization of Amino-Functionalized Alkoxy Silane Passivation Films. [electronic resource]
Publication details: ACS applied materials & interfaces Jan 2020Description: 4678-4688 p. digitalISSN:- 1944-8252
No physical items for this record
Publication Type: Journal Article
There are no comments on this title.
Log in to your account to post a comment.