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	1.	Fast resist-activation dosimetry for extreme ultra-violet lithography. [electronic resource] by Heo, Jinseok Xu, Man Maas, Diederik Producer: 20180205 In: Optics express vol. 25 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	2.	High-speed spatial atomic-layer deposition of aluminum oxide layers for solar cell passivation. [electronic resource] by Poodt, Paul Lankhorst, Adriaan Roozeboom, Fred Spee, Karel Maas, Diederik Vermeer, Ad Producer: 20101207 In: Advanced materials (Deerfield Beach, Fla.) vol. 22 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	3.	Imaging and nanofabrication with the helium ion microscope of the Van Leeuwenhoek Laboratory in Delft. [electronic resource] by Alkemade, Paul F A Koster, Emma M van Veldhoven, Emile Maas, Diederik J Producer: 20120823 In: Scanning vol. 34 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	4.	Nanopillar growth by focused helium ion-beam-induced deposition. [electronic resource] by Chen, Ping van Veldhoven, Emile Sanford, Colin A Salemink, Huub W M Maas, Diederik J Smith, Daryl A Rack, Philip D Alkemade, Paul F A Producer: 20110214 In: Nanotechnology vol. 21 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)

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