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Tensile Ge microstructures for lasing fabricated by means of a silicon complementary metal-oxide-semiconductor process. [electronic resource] by
- Capellini, G
- Reich, C
- Guha, S
- Yamamoto, Y
- Lisker, M
- Virgilio, M
- Ghrib, A
- El Kurdi, M
- Boucaud, P
- Tillack, B
- Schroeder, T
Producer: 20141006
In:
Optics express vol. 22
Availability: No items available.
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Metal-Free CVD Graphene Synthesis on 200 mm Ge/Si(001) Substrates. [electronic resource] by
- Lukosius, M
- Dabrowski, J
- Kitzmann, J
- Fursenko, O
- Akhtar, F
- Lisker, M
- Lippert, G
- Schulze, S
- Yamamoto, Y
- Schubert, M A
- Krause, H M
- Wolff, A
- Mai, A
- Schroeder, T
- Lupina, G
Producer: 20180718
In:
ACS applied materials & interfaces vol. 8
Availability: No items available.
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