Application of ultrahigh vacuum reflection electron microscopy for the study of clean silicon surfaces in sublimation, epitaxy, and phase transitions. [electronic resource]

By: Contributor(s): Producer: 19920917Description: 341-51 p. digitalISSN:
  • 1059-910X
Subject(s): Online resources: In: Microscopy research and technique vol. 20
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Publication Type: Journal Article

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