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	1.	Low-temperature deposition of high-quality silicon oxynitride films for CMOS-integrated optics. [electronic resource] by Rangarajan, B Kovalgin, A Y Wörhoff, K Schmitz, J Producer: 20130912 In: Optics letters vol. 38 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	2.	Replication molds having nanometer-scale shape control fabricated by means of oxidation and etching. [electronic resource] by Kim, G M Kovalgin, A Holleman, J Brugger, J Producer: 20030922 In: Journal of nanoscience and nanotechnology vol. 2 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	3.	A difference in using atomic layer deposition or physical vapour deposition TiN as electrode material in metal-insulator-metal and metal-insulator-silicon capacitors. [electronic resource] by Groenland, A W Wolters, R A M Kovalgin, A Y Schmitz, J Producer: 20111206 In: Journal of nanoscience and nanotechnology vol. 11 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	4.	Encapsulation of epitaxial silicene on ZrB [electronic resource] by Wiggers, F B Yamada-Takamura, Y Kovalgin, A Y de Jong, M P Producer: 20180607 In: The Journal of chemical physics vol. 147 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	5.	Ultra-thin atomic layer deposited TiN films: non-linear I-V behaviour and the importance of surface passivation. [electronic resource] by Van Bui, H Aarnink, A A I Kovalgin, A Y Wolters, R A M Producer: 20111206 In: Journal of nanoscience and nanotechnology vol. 11 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	6.	Interaction of epitaxial silicene with overlayers formed by exposure to Al atoms and O2 molecules. [electronic resource] by Friedlein, R Van Bui, H Wiggers, F B Yamada-Takamura, Y Kovalgin, A Y de Jong, M P Producer: 20150413 In: The Journal of chemical physics vol. 140 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	7.	On the feasibility of silicene encapsulation by AlN deposited using an atomic layer deposition process. [electronic resource] by Van Bui, H Wiggers, F B Friedlein, R Yamada-Takamura, Y Kovalgin, A Y de Jong, M P Producer: 20150803 In: The Journal of chemical physics vol. 142 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	8.	A nitride-based epitaxial surface layer formed by ammonia treatment of silicene-terminated ZrB2. [electronic resource] by Wiggers, F B Van Bui, H Friedlein, R Yamada-Takamura, Y Schmitz, J Kovalgin, A Y de Jong, M P Producer: 20160823 In: The Journal of chemical physics vol. 144 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)