APA

Lee B. H., Hwang J. K., Nam J. W., Lee S. U., Kim J. T., Koo S., Baunemann A., Fischer R. A. & Sung M. M. (20090730). Low-temperature atomic layer deposition of copper metal thin films: self-limiting surface reaction of copper dimethylamino-2-propoxide with diethylzinc. : Angewandte Chemie (International ed. in English).

Chicago

Lee Byoung H, Hwang Jae K, Nam Jae W, Lee Song U, Kim Jun T, Koo Sang-M, Baunemann A, Fischer Roland A and Sung Myung M. 20090730. Low-temperature atomic layer deposition of copper metal thin films: self-limiting surface reaction of copper dimethylamino-2-propoxide with diethylzinc. : Angewandte Chemie (International ed. in English).

Harvard

Lee B. H., Hwang J. K., Nam J. W., Lee S. U., Kim J. T., Koo S., Baunemann A., Fischer R. A. and Sung M. M. (20090730). Low-temperature atomic layer deposition of copper metal thin films: self-limiting surface reaction of copper dimethylamino-2-propoxide with diethylzinc. : Angewandte Chemie (International ed. in English).

MLA

Lee Byoung H, Hwang Jae K, Nam Jae W, Lee Song U, Kim Jun T, Koo Sang-M, Baunemann A, Fischer Roland A and Sung Myung M. Low-temperature atomic layer deposition of copper metal thin films: self-limiting surface reaction of copper dimethylamino-2-propoxide with diethylzinc. : Angewandte Chemie (International ed. in English). 20090730.