APA

Fan C., Shang M., Li B., Lin Y., Wang S., Lee W. & Hung B. (2015). Teflon/SiO₂ Bilayer Passivation for Improving the Electrical Reliability of Oxide TFTs Fabricated Using a New Two-Photomask Self-Alignment Process. : Materials (Basel, Switzerland).

Chicago

Fan Ching-Lin, Shang Ming-Chi, Li Bo-Jyun, Lin Yu-Zuo, Wang Shea-Jue, Lee Win-Der and Hung Bohr-Ran. 2015. Teflon/SiO₂ Bilayer Passivation for Improving the Electrical Reliability of Oxide TFTs Fabricated Using a New Two-Photomask Self-Alignment Process. : Materials (Basel, Switzerland).

Harvard

Fan C., Shang M., Li B., Lin Y., Wang S., Lee W. and Hung B. (2015). Teflon/SiO₂ Bilayer Passivation for Improving the Electrical Reliability of Oxide TFTs Fabricated Using a New Two-Photomask Self-Alignment Process. : Materials (Basel, Switzerland).

MLA

Fan Ching-Lin, Shang Ming-Chi, Li Bo-Jyun, Lin Yu-Zuo, Wang Shea-Jue, Lee Win-Der and Hung Bohr-Ran. Teflon/SiO₂ Bilayer Passivation for Improving the Electrical Reliability of Oxide TFTs Fabricated Using a New Two-Photomask Self-Alignment Process. : Materials (Basel, Switzerland). 2015.