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	1.	Atomic-precision multilayer coating of the first set of optics for an extreme-ultraviolet lithography prototype system. [electronic resource] by Montcalm, Claude Grabner, R Frederick Hudyma, Russell M Schmidt, Mark A Spiller, Eberhard Walton, Christopher C Wedowski, Marco Folta, James A Producer: 20020705 In: Applied optics vol. 41 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	2.	Sub-diffraction-limited multilayer coatings for the 0.3 numerical aperture micro-exposure tool for extreme ultraviolet lithography. [electronic resource] by Soufli, Regina Hudyma, Russell M Spiller, Eberhard Gullikson, Eric M Schmidt, Mark A Robinson, Jeff C Baker, Sherry L Walton, Christopher C Taylor, John S Producer: 20070724 In: Applied optics vol. 46 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)

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