Using low-contrast negative-tone PMMA at cryogenic temperatures for 3D electron beam lithography. [electronic resource]

By: Contributor(s): Producer: 20160805Description: 195301 p. digitalISSN:
  • 1361-6528
Online resources: In: Nanotechnology vol. 27
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Publication Type: Journal Article; Research Support, Non-U.S. Gov't

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