APA

Zhang L., Guo Y., Hassan V. V., Tang K., Foad M. A., Woicik J. C., Pianetta P., Robertson J. & McIntyre P. C. (20180718). Interface Engineering for Atomic Layer Deposited Alumina Gate Dielectric on SiGe Substrates. : ACS applied materials & interfaces.

Chicago

Zhang Liangliang, Guo Yuzheng, Hassan Vinayak Vishwanath, Tang Kechao, Foad Majeed A, Woicik Joseph C, Pianetta Piero, Robertson John and McIntyre Paul C. 20180718. Interface Engineering for Atomic Layer Deposited Alumina Gate Dielectric on SiGe Substrates. : ACS applied materials & interfaces.

Harvard

Zhang L., Guo Y., Hassan V. V., Tang K., Foad M. A., Woicik J. C., Pianetta P., Robertson J. and McIntyre P. C. (20180718). Interface Engineering for Atomic Layer Deposited Alumina Gate Dielectric on SiGe Substrates. : ACS applied materials & interfaces.

MLA

Zhang Liangliang, Guo Yuzheng, Hassan Vinayak Vishwanath, Tang Kechao, Foad Majeed A, Woicik Joseph C, Pianetta Piero, Robertson John and McIntyre Paul C. Interface Engineering for Atomic Layer Deposited Alumina Gate Dielectric on SiGe Substrates. : ACS applied materials & interfaces. 20180718.