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	1.	Sub-nanometer metrology of optical wafers using an angle-scanned Fabry-Perot interferometer. [electronic resource] by Arkwright, John Farrant, David Zhang, Jun Producer: 20121002 In: Optics express vol. 14 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	2.	Sensitivity errors in interferometric deformation metrology. [electronic resource] by Farrant, David I Petzing, Jon N Producer: 20031107 In: Applied optics vol. 42 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	3.	Measuring the thickness profiles of wafers to subnanometer resolution using Fabry-Perot interferometry. [electronic resource] by Farrant, David I Arkwright, John W Fairman, Philip S Netterfield, Roger P Producer: 20071206 In: Applied optics vol. 46 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	4.	Copper-capped carbon nanocones on silicon: plasma-enabled growth control. [electronic resource] by Kumar, Shailesh Levchenko, Igor Farrant, David Keidar, Michael Kersten, Holger Ostrikov, Kostya Ken Producer: 20130530 In: ACS applied materials & interfaces vol. 4 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	5.	Measuring coalignment of retroreflectors with large lateral incoming-outgoing beam offset. [electronic resource] by Schütze, Daniel Farrant, David Shaddock, Daniel A Sheard, Benjamin S Heinzel, Gerhard Danzmann, Karsten Producer: 20160321 In: The Review of scientific instruments vol. 85 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)