High-temperature residual stresses in thin films characterized by x-ray diffraction substrate curvature method. [electronic resource]

By: Contributor(s): Producer: 20070619Description: 036103 p. digitalISSN:
  • 0034-6748
Online resources: In: The Review of scientific instruments vol. 78
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Publication Type: Journal Article; Research Support, Non-U.S. Gov't

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