APA

Saha S. K., Oakdale J. S., Cuadra J. A., Divin C., Ye J., Forien J., Bayu Aji L. B., Biener J. & Smith W. L. (20180731). Radiopaque Resists for Two-Photon Lithography To Enable Submicron 3D Imaging of Polymer Parts via X-ray Computed Tomography. : ACS applied materials & interfaces.

Chicago

Saha Sourabh K, Oakdale James S, Cuadra Jefferson A, Divin Chuck, Ye Jianchao, Forien Jean-Baptiste, Bayu Aji Leonardus B, Biener Juergen and Smith William L. 20180731. Radiopaque Resists for Two-Photon Lithography To Enable Submicron 3D Imaging of Polymer Parts via X-ray Computed Tomography. : ACS applied materials & interfaces.

Harvard

Saha S. K., Oakdale J. S., Cuadra J. A., Divin C., Ye J., Forien J., Bayu Aji L. B., Biener J. and Smith W. L. (20180731). Radiopaque Resists for Two-Photon Lithography To Enable Submicron 3D Imaging of Polymer Parts via X-ray Computed Tomography. : ACS applied materials & interfaces.

MLA

Saha Sourabh K, Oakdale James S, Cuadra Jefferson A, Divin Chuck, Ye Jianchao, Forien Jean-Baptiste, Bayu Aji Leonardus B, Biener Juergen and Smith William L. Radiopaque Resists for Two-Photon Lithography To Enable Submicron 3D Imaging of Polymer Parts via X-ray Computed Tomography. : ACS applied materials & interfaces. 20180731.