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	1.	Directed self-assembly of high-chi block copolymer for nano fabrication of bit patterned media via solvent annealing. [electronic resource] by Xiong, Shisheng Chapuis, Yves-Andre Wan, Lei Gao, He Li, Xiao Ruiz, Ricardo Nealey, Paul F Producer: 20180718 In: Nanotechnology vol. 27 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	2.	Directed Self-Assembly of Triblock Copolymer on Chemical Patterns for Sub-10-nm Nanofabrication via Solvent Annealing. [electronic resource] by Xiong, Shisheng Wan, Lei Ishida, Yoshihito Chapuis, Yves-Andre Craig, Gordon S W Ruiz, Ricardo Nealey, Paul F Producer: 20180719 In: ACS nano vol. 10 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	3.	Transfer of self-aligned spacer patterns for single-digit nanofabrication. [electronic resource] by Doerk, Gregory S Gao, He Wan, Lei Lille, Jeff Patel, K C Chapuis, Yves-Andre Ruiz, Ricardo Albrecht, Thomas R Producer: 20150330 In: Nanotechnology vol. 26 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)

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