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	1.	Revolution in x-ray optics. [electronic resource] by Ceglio, N M Producer: 20121002 In: Journal of X-ray science and technology vol. 1 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	2.	Wavelength considerations in soft-x-ray projection lithography. [electronic resource] by Hawryluk, A M Ceglio, N M Producer: 20130704 In: Applied optics vol. 32 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	3.	Micro-Fresnel zone plates for coded imaging applications. [electronic resource] by Ceglio, N M Smith, H I Producer: 20121002 In: The Review of scientific instruments vol. 49 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	4.	Wafer cost analysis for a soft x-ray projection lithography system. [electronic resource] by Ceglio, N M Hawryluk, A M Producer: 20121002 In: Journal of X-ray science and technology vol. 3 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	5.	Power loading limitations in soft x-ray projection lithography. [electronic resource] by Hawryluk, A M Ceglio, N M Producer: 20121002 In: Journal of X-ray science and technology vol. 4 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	6.	Introduction to special issue of Applied Optics on soft-x-ray projection lithography. [electronic resource] by Silfvast, W T Ceglio, N M Producer: 20130704 In: Applied optics vol. 32 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	7.	Imaging x-ray spectrometer for laser fusion applications. [electronic resource] by Ceglio, N M Hawryluk, A M Price, R H Producer: 20100520 In: Applied optics vol. 21 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	8.	Front-end design issues in soft-x-ray projection lithography. [electronic resource] by Ceglio, N M Hawryluk, A M Sommargren, G E Producer: 20130704 In: Applied optics vol. 32 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	9.	Time-resolved x-ray transmission grating spectrometer for studying laser-produced plasmas. [electronic resource] by Ceglio, N M Kauffman, R L Hawryluk, A M Medecki, H Producer: 20081110 In: Applied optics vol. 22 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	10.	Demonstration of guided-wave phenomena at extreme-ultraviolet and soft-x-ray wavelengths. [electronic resource] by Ceglio, N M Hawryluk, A M Stearns, D G Kühne, M Müller, P Producer: 20091211 In: Optics letters vol. 13 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	11.	Radiation hardness of molybdenum silicon multilayers designed for use in a soft-x-ray projection lithography system. [electronic resource] by Gaines, D P Spitzer, R C Ceglio, N M Krumrey, M Ulm, G Producer: 20130704 In: Applied optics vol. 32 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	12.	Multipass amplification of soft x-rays in a laser cavity. [electronic resource] by Ceglio, N M Stearns, D G Gaines, D F Hawryluk, A M Trebes, J E Producer: 20121002 In: Optics letters vol. 13 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	13.	Time-resolved measurement of double-pass amplification of soft x rays. [electronic resource] by Ceglio, N M Gaines, D P Trebes, J E London, R A Stearns, D G Producer: 20121002 In: Applied optics vol. 27 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	14.	Undulator radiation for at-wavelength interferometry of optics for extreme-ultraviolet lithography. [electronic resource] by Attwood, D Sommargren, G Beguiristain, R Nguyen, K Bokor, J Ceglio, N Jackson, K Koike, M Underwood, J Producer: 20130704 In: Applied optics vol. 32 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)