Hydrogen dependent surface morphology study of plasma deposited SiN(x):H films for two gas systems SiH4/NH3 and SiH4/N2. [electronic resource]

By: Contributor(s): Producer: 20120320Description: 11216-21 p. digitalISSN:
  • 1533-4880
Online resources: In: Journal of nanoscience and nanotechnology vol. 11
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Publication Type: Journal Article

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