APA

Chen F., Zhao E., Kim T., Wang J., Hableel G., Reardon P. J. T., Ananthakrishna S. J., Wang T., Arconada-Alvarez S., Knowles J. C. & Jokerst J. V. (20180725). Organosilica Nanoparticles with an Intrinsic Secondary Amine: An Efficient and Reusable Adsorbent for Dyes. : ACS applied materials & interfaces.

Chicago

Chen Fang, Zhao Eric, Kim Taeho, Wang Junxin, Hableel Ghanim, Reardon Philip James Thomas, Ananthakrishna Soundaram Jeevarathinam, Wang Tianyu, Arconada-Alvarez Santiago, Knowles Jonathan C and Jokerst Jesse V. 20180725. Organosilica Nanoparticles with an Intrinsic Secondary Amine: An Efficient and Reusable Adsorbent for Dyes. : ACS applied materials & interfaces.

Harvard

Chen F., Zhao E., Kim T., Wang J., Hableel G., Reardon P. J. T., Ananthakrishna S. J., Wang T., Arconada-Alvarez S., Knowles J. C. and Jokerst J. V. (20180725). Organosilica Nanoparticles with an Intrinsic Secondary Amine: An Efficient and Reusable Adsorbent for Dyes. : ACS applied materials & interfaces.

MLA

Chen Fang, Zhao Eric, Kim Taeho, Wang Junxin, Hableel Ghanim, Reardon Philip James Thomas, Ananthakrishna Soundaram Jeevarathinam, Wang Tianyu, Arconada-Alvarez Santiago, Knowles Jonathan C and Jokerst Jesse V. Organosilica Nanoparticles with an Intrinsic Secondary Amine: An Efficient and Reusable Adsorbent for Dyes. : ACS applied materials & interfaces. 20180725.