Comparative study of atomic-layer-deposited stacked (HfO2/Al2O3) and nanolaminated (HfAlOx) dielectrics on In0.53Ga0.47As. [electronic resource]

By: Contributor(s): Producer: 20131017Description: 4195-201 p. digitalISSN:
  • 1944-8252
Online resources: In: ACS applied materials & interfaces vol. 5
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Publication Type: Journal Article

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