Results
|
|
9861.
|
|
|
|
9862.
|
|
|
|
9863.
|
|
|
|
9864.
|
|
|
|
9865.
|
|
|
|
9866.
|
|
|
|
9867.
|
|
|
|
9868.
|
|
|
|
9869.
|
|
|
|
9870.
|
Damage-free back channel wet-etch process in amorphous indium-zinc-oxide thin-film transistors using a carbon-nanofilm barrier layer. [electronic resource] by
- Luo, Dongxiang
- Zhao, Mingjie
- Xu, Miao
- Li, Min
- Chen, Zikai
- Wang, Lang
- Zou, Jianhua
- Tao, Hong
- Wang, Lei
- Peng, Junbiao
Producer: 20150409
In:
ACS applied materials & interfaces vol. 6
Availability: No items available.
|
|
|
9871.
|
|
|
|
9872.
|
|
|
|
9873.
|
|
|
|
9874.
|
|
|
|
9875.
|
|
|
|
9876.
|
|
|
|
9877.
|
|
|
|
9878.
|
|
|
|
9879.
|
|
|
|
9880.
|
|