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Orienting the demixion of a diblock copolymer using 193 nm interferometric lithography for the controlled deposition of nanoparticles. [electronic resource] by
- Dirani, Ali
- Stehlin, Fabrice
- Dika, Ihab
- Spangenberg, Arnaud
- Grumbach, Nathan
- Gallani, Jean-Louis
- Donnio, Bertrand
- Greget, Romain
- Begin-Colin, Sylvie
- Demortière, Arnaud
- Soppera, Olivier
Producer: 20120321
In:
Macromolecular rapid communications vol. 32
Availability: No items available.
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620.
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