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Industry-relevant magnetron sputtering and cathodic arc ultra-high vacuum deposition system for in situ x-ray diffraction studies of thin film growth using high energy synchrotron radiation. [electronic resource] by
- Schroeder, J L
- Thomson, W
- Howard, B
- Schell, N
- Näslund, L-Å
- Rogström, L
- Johansson-Jõesaar, M P
- Ghafoor, N
- Odén, M
- Nothnagel, E
- Shepard, A
- Greer, J
- Birch, J
Producer: 20151223
In:
The Review of scientific instruments vol. 86
Availability: No items available.
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