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Electron attachment to sulfur oxyhalides: SOF2, SOCl2, SO2F2, SO2Cl2, and SO2FCl attachment rate coefficients, 300-900 K. [electronic resource] by
- Miller, Thomas M
- Friedman, Jeffrey F
- Caples, Connor M
- Shuman, Nicholas S
- Van Doren, Jane M
- Bardaro, Michael F
- Nguyen, Pho
- Zweiben, Cindy
- Campbell, Matthew J
- Viggiano, A A
Producer: 20100901
In:
The Journal of chemical physics vol. 132
Availability: No items available.
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