Liao, Bo-Huei <br/><br/>
Characterization of silicon oxynitride films deposited by a high-power impulse magnetron sputtering deposition technique.  [electronic resource] 

 -  Applied optics  Feb 2020 
 - A176-A180 p.  digital 
<br/><br/> Publication Type: Journal Article 
<br/><br/><label>ISSN: </label>1539-4522 
<br/><br/><label>Standard No.: </label>10.1364/AO.377983  doi