TY  - GEN
AU  - Coulon,Pierre-Marie
AU  - Feng,Peng
AU  - Damilano,Benjamin
AU  - Vézian,Stéphane
AU  - Wang,Tao
AU  - Shields,Philip A
TI  - Influence of the reactor environment on the selective area thermal etching of GaN nanohole arrays
SN  - 2045-2322
PY  - 2020///
PB  - Scientific reports
N1  - Publication Type: Journal Article
UR  - https://doi.org/10.1038/s41598-020-62539-1
ER  -