Coulon, Pierre-Marie <br/><br/>
Influence of the reactor environment on the selective area thermal etching of GaN nanohole arrays.  [electronic resource] 

 -  Scientific reports  Mar 2020 
 - 5642 p.  digital 
<br/><br/> Publication Type: Journal Article 
<br/><br/><label>ISSN: </label>2045-2322 
<br/><br/><label>Standard No.: </label>10.1038/s41598-020-62539-1  doi