Askey, Joseph <br/><br/>
Use of Two-Photon Lithography with a Negative Resist and Processing to Realise Cylindrical Magnetic Nanowires.  [electronic resource] 

 -  Nanomaterials (Basel, Switzerland)  Feb 2020 
<br/><br/> Publication Type: Journal Article 
<br/><br/><label>ISSN: </label>2079-4991 
<br/><br/><label>Standard No.: </label>10.3390/nano10030429  doi