Hu, Ruijin <br/><br/>
Facile 3D integration of Si nanowires on Bosch-etched sidewalls for stacked channel transistors.  [electronic resource] 

 -  Nanoscale  Jan 2020 
 - 2787-2792 p.  digital 
<br/><br/> Publication Type: Journal Article 
<br/><br/><label>ISSN: </label>2040-3372 
<br/><br/><label>Standard No.: </label>10.1039/c9nr09000b  doi