Wang, Yuancheng <br/><br/>
Radio Frequency Plasma-Enhanced Reactive Magnetron Sputtering Deposition of α-SiN   [electronic resource] 

 -  ACS omega  Dec 2019 
 - 20205-20211 p.  digital 
<br/><br/> Publication Type: Journal Article 
<br/><br/><label>ISSN: </label>2470-1343 
<br/><br/><label>Standard No.: </label>10.1021/acsomega.9b02452  doi