Coulon, Pierre-Marie <br/><br/>
Displacement Talbot lithography for nano-engineering of III-nitride materials.  [electronic resource] 

 -  Microsystems & nanoengineering  2019 
 - 52 p.  digital 
<br/><br/> Publication Type: Journal Article 
<br/><br/><label>ISSN: </label>2055-7434 
<br/><br/><label>Standard No.: </label>10.1038/s41378-019-0101-2  doi