Chrostowski, Marta <br/><br/>
Annealing of Boron-Doped Hydrogenated Crystalline Silicon Grown at Low Temperature by PECVD.  [electronic resource] 

 -  Materials (Basel, Switzerland)  Nov 2019 
<br/><br/> Publication Type: Journal Article 
<br/><br/><label>ISSN: </label>1996-1944 
<br/><br/><label>Standard No.: </label>10.3390/ma12223795  doi