Sultan, M T <br/><br/>
Efficacy of annealing and fabrication parameters on photo-response of SiGe in TiO  [electronic resource] 

 -  Nanotechnology  Sep 2019 
 - 365604 p.  digital 
<br/><br/> Publication Type: Journal Article 
<br/><br/><label>ISSN: </label>1361-6528 
<br/><br/><label>Standard No.: </label>10.1088/1361-6528/ab260e  doi