Flatabø, Ranveig <br/><br/>
Exploring proximity effects and large depth of field in helium ion beam lithography: large-area dense patterns and tilted surface exposure.  [electronic resource] 

 -  Nanotechnology  Jul 2018 
 - 275301 p.  digital 
<br/><br/> Publication Type: Journal Article 
<br/><br/><label>ISSN: </label>1361-6528 
<br/><br/><label>Standard No.: </label>10.1088/1361-6528/aabe22  doi