Lee, Hyung-Ik <br/><br/>
Degradation by water vapor of hydrogenated amorphous silicon oxynitride films grown at low temperature.  [electronic resource] 

 -  Scientific reports  10 2017 
 - 14146 p.  digital 
<br/><br/> Publication Type: Journal Article 
<br/><br/><label>ISSN: </label>2045-2322 
<br/><br/><label>Standard No.: </label>10.1038/s41598-017-14291-2  doi