Lin, Yu-De <br/><br/>
Retention Model of TaO/HfO   [electronic resource] 

 -  Nanoscale research letters  Dec 2017 
 - 407 p.  digital 
<br/><br/> Publication Type: Journal Article 
<br/><br/><label>ISSN: </label>1931-7573 
<br/><br/><label>Standard No.: </label>10.1186/s11671-017-2179-5  doi