Ellsworth, Ashley A <br/><br/>
Role of the Reducing Agent in the Electroless Deposition of Copper on Functionalized SAMs.  [electronic resource] 

 -  Langmuir : the ACS journal of surfaces and colloids  09 2017 
 - 8663-8670 p.  digital 
<br/><br/> Publication Type: Journal Article; Research Support, U.S. Gov't, Non-P.H.S. 
<br/><br/><label>ISSN: </label>1520-5827 
<br/><br/><label>Standard No.: </label>10.1021/acs.langmuir.7b00103  doi