Wang, Xing <br/><br/>
Structural Properties Characterized by the Film Thickness and Annealing Temperature for La  [electronic resource] 

 -  Nanoscale research letters  Dec 2017 
 - 233 p.  digital 
<br/><br/> Publication Type: Journal Article 
<br/><br/><label>ISSN: </label>1931-7573 
<br/><br/><label>Standard No.: </label>10.1186/s11671-017-2018-8  doi