Metzler, Dominik <br/><br/>
Characterizing fluorocarbon assisted atomic layer etching of Si using cyclic Ar/C  [electronic resource] 

 -  The Journal of chemical physics  Feb 2017 
 - 052801 p.  digital 
<br/><br/> Publication Type: Journal Article 
<br/><br/><label>ISSN: </label>1089-7690 
<br/><br/><label>Standard No.: </label>10.1063/1.4961458  doi