Lee, Min-Seon <br/><br/>
Post-Cleaning Effect on a HfO2 Gate Stack Using a NF3/NH3 Plasma.  [electronic resource] 

 -  Journal of nanoscience and nanotechnology  May 2016 
 - 4808-13 p.  digital 
<br/><br/> Publication Type: Journal Article; Research Support, Non-U.S. Gov't 
<br/><br/><label>ISSN: </label>1533-4899 
<br/><br/><label>Standard No.: </label>10.1166/jnn.2016.12257  doi