TY  - GEN
AU  - Probst,Christian
AU  - Meichner,Christoph
AU  - Kreger,Klaus
AU  - Kador,Lothar
AU  - Neuber,Christian
AU  - Schmidt,Hans-Werner
TI  - Athermal Azobenzene-Based Nanoimprint Lithography
SN  - 1521-4095
PY  - 2016///1214
KW  - Azo Compounds
KW  - chemistry
KW  - Dimethylpolysiloxanes
KW  - Isomerism
KW  - Microscopy, Atomic Force
KW  - Microscopy, Electron, Scanning
KW  - Nanostructures
KW  - Nanotechnology
KW  - Ultraviolet Rays
N1  - Publication Type: Journal Article; Research Support, Non-U.S. Gov't
UR  - https://doi.org/10.1002/adma.201505552
ER  -