You, Seung-Won <br/><br/>
Effects of La Incorporation in Hf Based Dielectric on Leakage Conduction and Carrier Scattering Mechanisms.  [electronic resource] 

 -  Journal of nanoscience and nanotechnology  Oct 2015 
 - 7590-2 p.  digital 
<br/><br/> Publication Type: Journal Article; Research Support, Non-U.S. Gov't 
<br/><br/><label>ISSN: </label>1533-4899 
<br/><br/><label>Standard No.: </label>10.1166/jnn.2015.11165  doi