Park, Cheolmin <br/><br/>
Analysis of Resistance and Surface Recombination Velocities by Contact Coverage for Optimizing Electrical Loss in c-Si Local Back Contact.  [electronic resource] 

 -  Journal of nanoscience and nanotechnology  Jun 2015 
 - 4398-402 p.  digital 
<br/><br/> Publication Type: Journal Article; Research Support, Non-U.S. Gov't 
<br/><br/><label>ISSN: </label>1533-4899 
<br/><br/><label>Standard No.: </label>10.1166/jnn.2015.9793  doi