Bonsu, Richard O <br/><br/>
Dioxo-Fluoroalkoxide Tungsten(VI) Complexes for Growth of WOx Thin Films by Aerosol-Assisted Chemical Vapor Deposition.  [electronic resource] 

 -  Inorganic chemistry  Aug 2015 
 - 7536-47 p.  digital 
<br/><br/> Publication Type: Journal Article 
<br/><br/><label>ISSN: </label>1520-510X 
<br/><br/><label>Standard No.: </label>10.1021/acs.inorgchem.5b01124  doi