Fei, Chenxi <br/><br/>
The influence of process parameters and pulse ratio of precursors on the characteristics of La1 - x Al x O3 films deposited by atomic layer deposition.  [electronic resource] 

 -  Nanoscale research letters  2015 
 - 180 p.  digital 
<br/><br/> Publication Type: Journal Article 
<br/><br/><label>ISSN: </label>1931-7573 
<br/><br/><label>Standard No.: </label>10.1186/s11671-015-0883-6  doi