Pi, T W <br/><br/>
In-situ atomic layer deposition of tri-methylaluminum and water on pristine single-crystal (In)GaAs surfaces: electronic and electric structures.  [electronic resource] 

 -  Nanotechnology  Apr 2015 
 - 164001 p.  digital 
<br/><br/> Publication Type: Journal Article; Research Support, Non-U.S. Gov't 
<br/><br/><label>ISSN: </label>1361-6528 
<br/><br/><label>Standard No.: </label>10.1088/0957-4484/26/16/164001  doi