Mukherjee, Tamal <br/><br/>
UV-assisted modification and removal mechanism of a fluorocarbon polymer film on low-k dielectric trench structure.  [electronic resource] 

 -  ACS applied materials & interfaces  Mar 2015 
 - 5051-5 p.  digital 
<br/><br/> Publication Type: Journal Article; Research Support, Non-U.S. Gov't 
<br/><br/><label>ISSN: </label>1944-8252 
<br/><br/><label>Standard No.: </label>10.1021/am508734b  doi